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The future of the EUV lithography market looks promising with opportunities in the integrated device manufacturers (IDM) and foundry industries. The global EUV lithography market is expected to grow with a CAGR of 27% to 29% from 2021 to 2026. The major drivers for this market are rising demand for miniaturization of chip size and increasing demand of EUV lithography manufacturing and production.
 
A more than 150 page report is developed to help in your business decisions. Sample figures with some insights are shown below. To learn the scope of, benefits, companies researched and other details of EUV lithography market report download the report brochure.

 
EUV lithography


EUV lithography
 
The study includes trends and forecast for the global EUV lithography market by light source, equipment, end use industry, and region as follows:
 
By Light Source [$M shipment analysis for 2015 – 2026]:
  • Laser Produced Plasmas (LPP)
  • Vacuum Sparks
  • Gas Discharges
By Equipment [$M shipment analysis for 2015 – 2026]:
  • Light Source
  • Mirrors
  • Mask
  • Others
By End Use Industry [$M shipment analysis for 2015 – 2026]:
  • Integrated device manufacturers (IDM)
  • Foundry
By Region [$M shipment analysis for 2015 – 2026]:
  • North America
  • United States
  • Canada
  • Mexico
  • Europe
  • Germany
  • United Kingdom
  • France
  • Italy
  • Asia Pacific
  • China
  • Japan
  • India
  • South Korea
  • The Rest of the World
Laser produced plasma (LPP) will remain the largest segment due to growth in the IDM end use industry. 
 
IDM will remain the largest end use industry during the forecast period due to rising demand in various consumer applications, majorly in smartphones.
 
Asia Pacific will remain the largest region during the forecast period due to increasing demand from Fab-less players at leading foundries and growing number of wafer processing capability in APAC region.
 
Some of the EUV lithography companies profiled in this report include ASML Holding, Nikon Corporation, Canon Inc., Carl Zeiss, Toppan Printing, NTT Advanced Technology, Intel, Samsung, SK Hynix, Toshiba, TSMC, and GLOBALFOUNDRIES.
 
 
Features of EUV Lithography Market
 
  • Market Size Estimates: EUV Lithography market size estimation in terms of value ($M)
  • Trend and Forecast Analysis: Market trends (2015-2020) and forecast (2021-2026) by various segments and regions.
  • Segmentation Analysis: Market size by light source, equipment, and end use industry
  • Regional Analysis: EUV Lithography market breakdown by North America, Europe, Asia Pacific, and the Rest of the World.
  • Growth Opportunities: Analysis on growth opportunities in different end use industries, light source, equipment, and regions for EUV lithography market.
  • Strategic Analysis: This includes M&A, new product development, and competitive landscape for the EUV lithography market.
  • Analysis of competitive intensity of the industry based on Porter’s Five Forces model.
 
 
 
This report answers following 11 key questions
 
Q.1 What are some of the most promising potential, high-growth opportunities for the global EUV lithography market by light source (laser produced plasma (LPP), vacuum sparks, and gas discharges), equipment (light source, mirror, mask, and others), end use industry (integrated device manufacturers (IDM) and foundry), and region (North America, Europe, Asia Pacific, and the Rest of the World)?
Q.2 Which segments will grow at a faster pace and why?
Q.3 Which regions will grow at a faster pace and why?
Q.4 What are the key factors affecting market dynamics? What are the drivers and challenges of the EUV lithography market?
Q.5 What are the business risks and threats to the EUV lithography market?
Q.6 What are emerging trends in the EUV lithography market and the reasons behind them?
Q.7 What are some changing demands of customers in the EUV lithography market?
Q.8 What are the new developments in the EUV lithography market? Which companies are leading these developments?
Q.9 Who are the major players in the EUV lithography market? What strategic initiatives are being implemented by key players for business growth?
Q.10 What are some of the competitive products and processes in the EUV lithography market, and how big of a threat do they pose for loss of market share via material or product substitution?
Q.11 What M&A activities did take place in the last five years in the EUV lithography market?
 

Table of Contents
 
  • Executive Summary
  • Market Background and Classifications
    • Introduction, Background, and Classifications
    • Supply Chain
    • Industry Drivers and Challenges
  • Market Trends and Forecast Analysis from 2015 to 2026
    • Macroeconomic Trends (2015-2020) and Forecast (2021-2026)
    • Global EUV Lithography Market Trends (2015-2020) and Forecast (2021-2026)
    • Global EUV Lithography Market by End Use Industry
      • Integrated device manufacturers (IDM)
      • Foundry
    • Global EUV Lithography Market by Light Source
      • Laser Produced Plasmas (LPP)
      • Vacuum Sparks
      • Gas Discharges
    • Global EUV Lithography Market by Equipment
      • Light Source
      • Mirrors
      • Mask
      • Others
  • Market Trends and Forecast Analysis by Region from 2015 to 2026
    • Global EUV Lithography Market by Region
    • North American EUV Lithography Market
      • Market by End Use Industry
      • The US EUV Lithography Market
      • The Canadian EUV Lithography Market
      • The Mexican EUV Lithography Market
    • European EUV Lithography Market
      • Market by End Use Industry
      • German EUV Lithography Market
      • United Kingdom EUV Lithography Market
      • French EUV Lithography Market
      • Italian EUV Lithography Market
    • APAC EUV Lithography Market
      • Market by End Use Industry
      • Chinese EUV Lithography Market
      • Japanese EUV Lithography Market
      • Indian EUV Lithography Market
      • South Korean EUV Lithography Market
    • ROW EUV Lithography Market
      • Market by End Use Industry
  • Competitor Analysis
    • Product Portfolio Analysis
    • Geographical Reach
    • Porter’s Five Forces Analysis
  • Growth Opportunities and Strategic Analysis
    • Growth Opportunity Analysis
      • Growth Opportunities for the Global EUV Lithography Market by End Use Industry
      • Growth Opportunities for the Global EUV Lithography Market by Light Source
      • Growth Opportunities for the Global EUV Lithography Market by Equipment
      • Growth Opportunities for the Global EUV Lithography Market by Region
    • Emerging Trends in the Global EUV Lithography Market
    • Strategic Analysis
      • New Product Development
      • Capacity Expansion of the Global EUV Lithography Market
      • Technology Development
      • Mergers and Acquisitions in the Global EUV Lithography Industry
  • Company Profiles of Leading Players
    • ASML Holding
    • Nikon Corporation
    • Canon Inc.
    • Carl Zeiss
    • Toppan Printing
    • NTT Advanced Technology
    • Intel
    • Samsung
    • SK Hynix
    • Toshiba
    • TSMC
    • GLOBALFOUNDRIES

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Lucintel has been in the business of market research and management consulting since 2000 and has published over 1000 market intelligence reports in various markets / applications and served over 1,000 clients worldwide. This study is a culmination of four months of full-time effort performed by Lucintel's analyst team. The analysts used the following sources for the creation and completion of this valuable report:
  • In-depth interviews of the major players in this market
  • Detailed secondary research from competitors’ financial statements and published data 
  • Extensive searches of published works, market, and database information pertaining to industry news, company press releases, and customer intentions
  • A compilation of the experiences, judgments, and insights of Lucintel’s professionals, who have analyzed and tracked this market over the years.
Extensive research and interviews are conducted across the supply chain of this market to estimate market share, market size, trends, drivers, challenges, and forecasts. Below is a brief summary of the primary interviews that were conducted by job function for this report.
 
Thus, Lucintel compiles vast amounts of data from numerous sources, validates the integrity of that data, and performs a comprehensive analysis. Lucintel then organizes the data, its findings, and insights into a concise report designed to support the strategic decision-making process. The figure below is a graphical representation of Lucintel’s research process. 
 

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